On-line spectral analysis of line edge roughness: algorithms qualification and transfer to etch
dc.contributor.author | Leunissen, Peter | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | DiBiase, Tony | |
dc.contributor.author | Yang, H. | |
dc.contributor.author | Azordegan, A. | |
dc.date.accessioned | 2021-10-16T02:52:56Z | |
dc.date.available | 2021-10-16T02:52:56Z | |
dc.date.issued | 2005 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/10772 | |
dc.source | IIOimport | |
dc.title | On-line spectral analysis of line edge roughness: algorithms qualification and transfer to etch | |
dc.type | Journal article | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.source.peerreview | no | |
dc.source.beginpage | 96 | |
dc.source.endpage | 101 | |
dc.source.journal | Semiconductor FabTech | |
dc.source.volume | 25 | |
imec.availability | Published - imec |
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