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Opportunities and challenges in immersion lithography

dc.contributor.authorMaenhoudt, Mireille
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorErcken, Monique
dc.contributor.authorCheng, Shaunee
dc.contributor.authorLeunissen, Peter
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-16T03:08:03Z
dc.date.available2021-10-16T03:08:03Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10820
dc.sourceIIOimport
dc.titleOpportunities and challenges in immersion lithography
dc.typeJournal article
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.source.peerreviewno
dc.source.beginpage571
dc.source.endpage578
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue4
dc.source.volume18
imec.availabilityPublished - imec


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