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The thermal stability of ALD Zr:Al mixed oxide thin films: an in situ TEM study

dc.contributor.authorNistor, L.C.
dc.contributor.authorRichard, Olivier
dc.contributor.authorZhao, Chao
dc.contributor.authorBender, Hugo
dc.contributor.authorVan Tendeloo, G.
dc.date.accessioned2021-10-16T03:39:25Z
dc.date.available2021-10-16T03:39:25Z
dc.date.issued2005-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10932
dc.sourceIIOimport
dc.titleThe thermal stability of ALD Zr:Al mixed oxide thin films: an in situ TEM study
dc.typeJournal article
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorBender, Hugo
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.source.peerreviewno
dc.source.beginpage1741
dc.source.endpage1750
dc.source.journalJournal of Materials Research
dc.source.issue7
dc.source.volume20
imec.availabilityPublished - imec


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