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Effect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure drying

dc.contributor.authorOrozco-Teran, R.A.
dc.contributor.authorGorman, B.P.
dc.contributor.authorMueller, D.W.
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorReidy, R.F.
dc.date.accessioned2021-10-16T03:48:35Z
dc.date.available2021-10-16T03:48:35Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/10963
dc.sourceIIOimport
dc.titleEffect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure drying
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage145
dc.source.endpage153
dc.source.journalThin Solid Films
dc.source.issue1_2
dc.source.volume471
imec.availabilityPublished - imec


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