Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water
| dc.contributor.author | Puurunen, Riikka | |
| dc.date.accessioned | 2021-10-16T04:18:52Z | |
| dc.date.available | 2021-10-16T04:18:52Z | |
| dc.date.issued | 2005 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11065 | |
| dc.source | IIOimport | |
| dc.title | Correlation between the growth-per-cycle and the surface hydroxyl group concentration in the atomic layer deposition of aluminum oxide from trimethylaluminum and water | |
| dc.type | Journal article | |
| dc.source.peerreview | no | |
| dc.source.beginpage | 6 | |
| dc.source.endpage | 10 | |
| dc.source.journal | Applied Surface Science | |
| dc.source.issue | 1_4 | |
| dc.source.volume | 245 | |
| imec.availability | Published - imec |
Files in this item
| Files | Size | Format | View |
|---|---|---|---|
|
There are no files associated with this item. |
|||