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Highly sensitive monitoring of Ru etching using optical emission

dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-16T04:59:00Z
dc.date.available2021-10-16T04:59:00Z
dc.date.issued2005-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11190
dc.sourceIIOimport
dc.titleHighly sensitive monitoring of Ru etching using optical emission
dc.typeJournal article
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.beginpageG176
dc.source.endpageG178
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue7
dc.source.volume8
imec.availabilityPublished - imec


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