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Selective single-wafer wet etching of Hf-based layers

dc.contributor.authorSnow, Jim
dc.contributor.authorKraus, Harald
dc.contributor.authorKovacs, Fredi
dc.contributor.authorClaes, Martine
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorVos, Rita
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.contributor.authorArcher, Leo
dc.date.accessioned2021-10-16T05:18:11Z
dc.date.available2021-10-16T05:18:11Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11249
dc.sourceIIOimport
dc.titleSelective single-wafer wet etching of Hf-based layers
dc.typeJournal article
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage115
dc.source.endpage120
dc.source.journalSemiconductor Fabtech
dc.source.issue28
imec.availabilityPublished - imec


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