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Characterization of atomic layer deposited nanoscale structure on dense dielectric substrates by X-ray reflectivity

dc.contributor.authorTravaly, Youssef
dc.contributor.authorSchuhmacher, J.
dc.contributor.authorMartin Hoyas, Ana
dc.contributor.authorAbell, T.
dc.contributor.authorSutcliffe, Vic
dc.contributor.authorJonas, M.
dc.contributor.authorVan Hove, Marleen
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-16T05:46:48Z
dc.date.available2021-10-16T05:46:48Z
dc.date.issued2005
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11330
dc.sourceIIOimport
dc.titleCharacterization of atomic layer deposited nanoscale structure on dense dielectric substrates by X-ray reflectivity
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage639
dc.source.endpage644
dc.source.journalMicroelectronic Engineering
dc.source.issue3_4
dc.source.volume82
imec.availabilityPublished - imec
imec.internalnotesProc. 9th Eur. Workshop on Materials for Advanced Metallization; March 2005; Dresden


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