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Low-k1 imaging for contacts and lines using immersion ArF

dc.contributor.authorVan Bavel, Mieke
dc.contributor.authorHendrickx, Eric
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-16T05:52:09Z
dc.date.available2021-10-16T05:52:09Z
dc.date.issued2005-02
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/11345
dc.sourceIIOimport
dc.titleLow-k1 imaging for contacts and lines using immersion ArF
dc.typeJournal article
dc.contributor.imecauthorVan Bavel, Mieke
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVandenberghe, Geert
dc.source.peerreviewno
dc.source.beginpage39
dc.source.endpage42
dc.source.journalSolid State Technology
dc.source.issue2
dc.source.volume48
imec.availabilityPublished - imec


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