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On the deposition and characterisation of thin SnO2 films

dc.contributor.authorCzech, Ingrid
dc.contributor.authorRoggen, Jean
dc.contributor.authorDe Schepper, Luc
dc.contributor.authorHuyberechts, Guido
dc.contributor.authorStals, Lambert
dc.date.accessioned2021-09-29T14:20:46Z
dc.date.available2021-09-29T14:20:46Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1142
dc.sourceIIOimport
dc.titleOn the deposition and characterisation of thin SnO2 films
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage131
dc.source.endpage133
dc.source.journalLe Vide Science, Technique et Applications
dc.source.issue279
imec.availabilityPublished - open access
imec.internalnotesTAFT'96. 5th international Symposium on trends and New Applications in Thin films. 1-3 April 1996, Colmar, France. Suppl. issue.


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