dc.contributor.author | Cho, Moon Ju | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Pourtois, Geoffrey | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Ragnarsson, Lars-Ake | |
dc.contributor.author | Kauerauf, Thomas | |
dc.contributor.author | Groeseneken, Guido | |
dc.contributor.author | De Gendt, Stefan | |
dc.contributor.author | Heyns, Marc | |
dc.contributor.author | Hwang, cheol seong | |
dc.date.accessioned | 2021-10-16T15:17:32Z | |
dc.date.available | 2021-10-16T15:17:32Z | |
dc.date.issued | 2007-04 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/11860 | |
dc.source | IIOimport | |
dc.title | Study of the reliability impact of chlorine precursor residues in the Atomic Layer Deposited HfO2 layers | |
dc.type | Journal article | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Pourtois, Geoffrey | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Ragnarsson, Lars-Ake | |
dc.contributor.imecauthor | Groeseneken, Guido | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.imecauthor | Heyns, Marc | |
dc.contributor.orcidimec | Pourtois, Geoffrey::0000-0003-2597-8534 | |
dc.contributor.orcidimec | Ragnarsson, Lars-Ake::0000-0003-1057-8140 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | no | |
dc.source.beginpage | 752 | |
dc.source.endpage | 758 | |
dc.source.journal | IEEE Trans. Electron Devices | |
dc.source.issue | 4 | |
dc.source.volume | 54 | |
imec.availability | Published - imec | |