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Breakdown and defect generation in ultra-thin gate oxide

dc.contributor.authorDepas, Michel
dc.contributor.authorVermeire, Bert
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-09-29T14:27:21Z
dc.date.available2021-09-29T14:27:21Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1206
dc.sourceIIOimport
dc.titleBreakdown and defect generation in ultra-thin gate oxide
dc.typeJournal article
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage382
dc.source.endpage386
dc.source.journalJournal of Applied Physics
dc.source.issue1
dc.source.volume80
imec.availabilityPublished - open access


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