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Interface engineering for Ge metal-oxide-semiconductor devices

dc.contributor.authordimoulas, A.
dc.contributor.authorBrunco, David
dc.contributor.authorFerrari, S.
dc.contributor.authorSeo, J.W.
dc.contributor.authorPanayiotatos, Y.
dc.contributor.authorSotiropoulos, A.
dc.contributor.authorConard, Thierry
dc.contributor.authorCaymax, Matty
dc.contributor.authorSpiga, S.
dc.contributor.authorFanciulli, M.
dc.contributor.authorDieker, C.
dc.contributor.authorEvangelou, E. K.
dc.contributor.authorGalata, S.
dc.contributor.authorHoussa, Michel
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T15:52:05Z
dc.date.available2021-10-16T15:52:05Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12079
dc.sourceIIOimport
dc.titleInterface engineering for Ge metal-oxide-semiconductor devices
dc.typeJournal article
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.source.peerreviewno
dc.source.beginpage6337
dc.source.endpage6943
dc.source.journalThin Solid Films 515
dc.source.issue16
dc.source.volume515
imec.availabilityPublished - imec


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