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Stress-induced large-area lift-off of crystalline Si films

dc.contributor.authorDross, Frederic
dc.contributor.authorRobbelein, Jo
dc.contributor.authorVandevelde, Bart
dc.contributor.authorVan Kerschaver, Emmanuel
dc.contributor.authorGordon, Ivan
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-16T15:56:48Z
dc.date.available2021-10-16T15:56:48Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12103
dc.sourceIIOimport
dc.titleStress-induced large-area lift-off of crystalline Si films
dc.typeJournal article
dc.contributor.imecauthorVandevelde, Bart
dc.contributor.imecauthorGordon, Ivan
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecVandevelde, Bart::0000-0002-6753-6438
dc.contributor.orcidimecGordon, Ivan::0000-0002-0713-8403
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.beginpage149
dc.source.endpage152
dc.source.journalApplied Physics A
dc.source.issue1
dc.source.volume89
imec.availabilityPublished - imec


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