Show simple item record

Immersion photoresist qualification

dc.contributor.authorErcken, Monique
dc.contributor.authorGronheid, Roel
dc.contributor.authorPollentier, Ivan
dc.contributor.authorLeray, Philippe
dc.date.accessioned2021-10-16T16:01:48Z
dc.date.available2021-10-16T16:01:48Z
dc.date.issued2007-05
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12128
dc.sourceIIOimport
dc.titleImmersion photoresist qualification
dc.typeJournal article
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.source.peerreviewno
dc.source.beginpage2
dc.source.journalSemiconductor Fabtech
dc.source.issue34
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record