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Thermal stability of supercritical thickness-strained Si layers on thin strain-relaxed buffers

dc.contributor.authorEscobedo-Cousin, E.
dc.contributor.authorOlsen, S.H.
dc.contributor.authorDobrosz, P.
dc.contributor.authorBull, S.J.
dc.contributor.authorO'Neill, A.G.
dc.contributor.authorCoulson, H.
dc.contributor.authorClaeys, Cor
dc.contributor.authorLoo, Roger
dc.contributor.authorDelhougne, Romain
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-16T16:02:26Z
dc.date.available2021-10-16T16:02:26Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12131
dc.sourceIIOimport
dc.titleThermal stability of supercritical thickness-strained Si layers on thin strain-relaxed buffers
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDelhougne, Romain
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage123502
dc.source.journalJournal of Applied Physics
dc.source.issue12
dc.source.volume102
imec.availabilityPublished - open access


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