dc.contributor.author | Iacopi, Francesca | |
dc.contributor.author | Vereecken, Philippe | |
dc.contributor.author | Schaekers, Marc | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Moelans, Nele | |
dc.contributor.author | Blanpain, Bart | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Detavernier, Christophe | |
dc.contributor.author | Griffiths, Hefin | |
dc.date.accessioned | 2021-10-16T16:49:35Z | |
dc.date.available | 2021-10-16T16:49:35Z | |
dc.date.issued | 2007 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12333 | |
dc.source | IIOimport | |
dc.title | Plasma enhanced CVD growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vereecken, Philippe | |
dc.contributor.imecauthor | Schaekers, Marc | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.orcidimec | Vereecken, Philippe::0000-0003-4115-0075 | |
dc.contributor.orcidimec | Schaekers, Marc::0000-0002-1496-7816 | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 505307 | |
dc.source.journal | Nanotechnology | |
dc.source.issue | 50 | |
dc.source.volume | 18 | |
imec.availability | Published - imec | |