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Degradation and breakdown of MOS gate stacks with high permittivity dielectrics

dc.contributor.authorKauerauf, Thomas
dc.date.accessioned2021-10-16T17:03:51Z
dc.date.available2021-10-16T17:03:51Z
dc.date.issued2007-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12388
dc.sourceIIOimport
dc.titleDegradation and breakdown of MOS gate stacks with high permittivity dielectrics
dc.typePHD thesis
dc.source.peerreviewno
dc.contributor.thesisadvisorGroeseneken, Guido
dc.contributor.thesisadvisorMaes, Herman
imec.availabilityPublished - imec


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