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Low-k dielectric reliability in copper interconnects

dc.contributor.authorLi, Yunlong
dc.date.accessioned2021-10-16T17:27:32Z
dc.date.available2021-10-16T17:27:32Z
dc.date.issued2007-09
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12476
dc.sourceIIOimport
dc.titleLow-k dielectric reliability in copper interconnects
dc.typePHD thesis
dc.contributor.imecauthorLi, Yunlong
dc.contributor.orcidimecLi, Yunlong::0000-0003-4791-4013
dc.source.peerreviewno
dc.contributor.thesisadvisorMaex, Karen
dc.contributor.thesisadvisorGroeseneken, Guido
dc.identifier.urlhttp://hdl.handle.net/1979/971
imec.availabilityPublished - imec


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