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Advanced nanoanalysis of a Hf-based high-k dielectric stack prior to activation

dc.contributor.authorMacKenzie, M.
dc.contributor.authorCraven, A.J.
dc.contributor.authorMcComb, D.W.
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorDocherty, F.T.
dc.contributor.authorMcGilvery, C.M.
dc.contributor.authorMcFadzean, S.
dc.date.accessioned2021-10-16T17:44:16Z
dc.date.available2021-10-16T17:44:16Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12533
dc.sourceIIOimport
dc.titleAdvanced nanoanalysis of a Hf-based high-k dielectric stack prior to activation
dc.typeJournal article
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageG33
dc.source.endpageG35
dc.source.journalElectrochemical and Solid-State Letters
dc.source.issue6
dc.source.volume10
imec.availabilityPublished - open access


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