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Kinetic to transport-limited anhydrous HF etching of silicon oxynitride films in supercritical CO2

dc.contributor.authorMorrish, Rachel
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorMuscat, Anthony
dc.date.accessioned2021-10-16T18:03:38Z
dc.date.available2021-10-16T18:03:38Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12597
dc.sourceIIOimport
dc.titleKinetic to transport-limited anhydrous HF etching of silicon oxynitride films in supercritical CO2
dc.typeJournal article
dc.source.peerreviewno
dc.source.beginpage15251
dc.source.endpage15257
dc.source.journalJournal of Physical Chemistry C
dc.source.issue42
dc.source.volume111
imec.availabilityPublished - imec


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