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Effectiveness of nitridation of hafnium silicate dielectrics: a comparison between thermal and plasma nitridation

dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorKaushik, Vidya
dc.contributor.authorEveraert, Jean-Luc
dc.contributor.authorTrojman, Lionel
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorPantisano, Luigi
dc.contributor.authorRohr, Erika
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T18:23:09Z
dc.date.available2021-10-16T18:23:09Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12658
dc.sourceIIOimport
dc.titleEffectiveness of nitridation of hafnium silicate dielectrics: a comparison between thermal and plasma nitridation
dc.typeJournal article
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorEveraert, Jean-Luc
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage1771
dc.source.endpage1775
dc.source.journalIEEE Trans. Electron Devices
dc.source.issue7
dc.source.volume54
imec.availabilityPublished - imec


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