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Thermal recovery from stress-induced high-k dielectric film degradation

dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorPantisano, Luigi
dc.contributor.authorRoussel, Philippe
dc.contributor.authorDegraeve, Robin
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-16T18:23:57Z
dc.date.available2021-10-16T18:23:57Z
dc.date.issued2007-02
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12660
dc.sourceIIOimport
dc.titleThermal recovery from stress-induced high-k dielectric film degradation
dc.typeJournal article
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage44515
dc.source.journalJournal of Applied Physics
dc.source.issue4
dc.source.volume101
imec.availabilityPublished - imec


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