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Evaluation of trap creation and charging in thin SiO2 using both SCM and C-AFM

dc.contributor.authorPolspoel, Wouter
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-16T18:44:41Z
dc.date.available2021-10-16T18:44:41Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12726
dc.sourceIIOimport
dc.titleEvaluation of trap creation and charging in thin SiO2 using both SCM and C-AFM
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.beginpage495
dc.source.endpage500
dc.source.journalMicroelectronic Engineering
dc.source.issue3
dc.source.volume84
imec.availabilityPublished - imec
imec.internalnotesPaper from E-MRS IUMRS ICEM 2006, Symposium F


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