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Profile control of novel non-Si gates using BCl3/N2 plasma

dc.contributor.authorShamiryan, Denis
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorEslava Fernandez, Salvador
dc.contributor.authorDemand, Marc
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBeckx, Stephan
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-16T19:38:17Z
dc.date.available2021-10-16T19:38:17Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12884
dc.sourceIIOimport
dc.titleProfile control of novel non-Si gates using BCl3/N2 plasma
dc.typeJournal article
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorBeckx, Stephan
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.beginpage739
dc.source.endpage744
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue3
dc.source.volume25
imec.availabilityPublished - imec


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