The study of effective work function modulation by As ion implantation in TiN/TaN/HfO2 stacks.
dc.contributor.author | Singanamalla, Raghunath | |
dc.contributor.author | Yu, HongYu | |
dc.contributor.author | Janssens, Tom | |
dc.contributor.author | Kubicek, Stefan | |
dc.contributor.author | De Meyer, Kristin | |
dc.date.accessioned | 2021-10-16T19:49:32Z | |
dc.date.available | 2021-10-16T19:49:32Z | |
dc.date.issued | 2007-03 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/12915 | |
dc.source | IIOimport | |
dc.title | The study of effective work function modulation by As ion implantation in TiN/TaN/HfO2 stacks. | |
dc.type | Journal article | |
dc.contributor.imecauthor | Kubicek, Stefan | |
dc.contributor.imecauthor | De Meyer, Kristin | |
dc.source.peerreview | no | |
dc.source.beginpage | L320 | |
dc.source.endpage | L322 | |
dc.source.journal | Japanese Journal of Applied Physics. Part 2: Letters | |
dc.source.issue | 14 | |
dc.source.volume | 46 | |
imec.availability | Published - imec |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |