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Accurate fin patterning in emerging devices for 32nm and beyond

dc.contributor.authorSnoeckx, Koen
dc.contributor.authorRooyackers, Rita
dc.contributor.authorJurczak, Gosia
dc.contributor.authorDixit, Abhisek
dc.date.accessioned2021-10-16T19:53:19Z
dc.date.available2021-10-16T19:53:19Z
dc.date.issued2007-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12926
dc.sourceIIOimport
dc.titleAccurate fin patterning in emerging devices for 32nm and beyond
dc.typeJournal article
dc.contributor.imecauthorSnoeckx, Koen
dc.contributor.imecauthorJurczak, Gosia
dc.source.peerreviewno
dc.source.beginpage68
dc.source.endpage70
dc.source.journalFuture Fab
dc.source.issue23
imec.availabilityPublished - imec


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