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dc.contributor.authorTorregiani, Cristina
dc.contributor.authorMaex, Karen
dc.contributor.authorBenedetti, Alessandro
dc.contributor.authorBender, Hugo
dc.contributor.authorVan Houtte, P.
dc.contributor.authorPawlak, Bartek
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-16T20:13:12Z
dc.date.available2021-10-16T20:13:12Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/12983
dc.sourceIIOimport
dc.titleImpact of Ni-silicide grain orientation on the strain and stress fields induced in patterned silicon
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorPawlak, Bartek
dc.source.peerreviewno
dc.source.beginpage54101
dc.source.journalApplied Physics Letters
dc.source.issue5
dc.source.volume90
imec.availabilityPublished - imec


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