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Multi-crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot-wire CVD silicon nitride as antireflection coating

dc.contributor.authorVerlaan, Vasco
dc.contributor.authorVan der Werf, C.H.M.
dc.contributor.authorHouweling, C.Z
dc.contributor.authorRomijn, I.G.
dc.contributor.authorWeeber, A.W.
dc.contributor.authorDekkers, Harold
dc.contributor.authorGoldbach, H.D.
dc.contributor.authorSchropp, R.E.I.
dc.date.accessioned2021-10-16T21:25:57Z
dc.date.available2021-10-16T21:25:57Z
dc.date.issued2007
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13180
dc.sourceIIOimport
dc.titleMulti-crystalline Si solar cells with very fast deposited (180 nm/min) passivating hot-wire CVD silicon nitride as antireflection coating
dc.typeJournal article
dc.contributor.imecauthorDekkers, Harold
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.source.peerreviewno
dc.source.beginpage563
dc.source.endpage573
dc.source.journalProgress in Photovoltaics: Research and applications
dc.source.issue7
dc.source.volume15
imec.availabilityPublished - imec


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