The potential of double patterning immersion lithography for the 32nm half pitch node
dc.contributor.author | Wiaux, Vincent | |
dc.contributor.author | Storms, Greet | |
dc.contributor.author | Cheng, Shaunee | |
dc.contributor.author | Maenhoudt, Mireille | |
dc.date.accessioned | 2021-10-16T21:43:43Z | |
dc.date.available | 2021-10-16T21:43:43Z | |
dc.date.issued | 2007-08 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13225 | |
dc.source | IIOimport | |
dc.title | The potential of double patterning immersion lithography for the 32nm half pitch node | |
dc.type | Journal article | |
dc.contributor.imecauthor | Wiaux, Vincent | |
dc.source.peerreview | no | |
dc.source.beginpage | 19 | |
dc.source.endpage | 22 | |
dc.source.journal | EuroAsia Semiconductor | |
dc.identifier.url | http://www.euroasiasemiconductor.com/print.php?id=8451 | |
imec.availability | Published - imec |
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