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Transition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge

dc.contributor.authorBalogh, Z.
dc.contributor.authorErdelyi, Z.
dc.contributor.authorBeke, D.L.
dc.contributor.authorLanger, G.
dc.contributor.authorCsik, A.
dc.contributor.authorBoyen, H.G.
dc.contributor.authorWiedwald, U.
dc.contributor.authorZiemann, P.
dc.contributor.authorPortavoce, A.
dc.contributor.authorGirardeaux, C.
dc.date.accessioned2021-10-17T06:14:51Z
dc.date.available2021-10-17T06:14:51Z
dc.date.issued2008
dc.identifier.issn0003-6951
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13335
dc.sourceIIOimport
dc.titleTransition from anomalous kinetics toward Fickian diffusion for Si dissolution into amorphous Ge
dc.typeJournal article
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage143104
dc.source.journalApplied Physics Letters
dc.source.issue14
dc.source.volume92
imec.availabilityPublished - open access


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