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Depth-profiling of vertical sidewall nanolayers on structured wafers by grazing incidence X-ray fluorescence

dc.contributor.authorHonicke, P.
dc.contributor.authorBeckhoff, B.
dc.contributor.authorKolbe, M.
dc.contributor.authorList, Scott
dc.contributor.authorConard, Thierry
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-17T07:43:23Z
dc.date.available2021-10-17T07:43:23Z
dc.date.issued2008
dc.identifier.issn0584-8547
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13886
dc.sourceIIOimport
dc.titleDepth-profiling of vertical sidewall nanolayers on structured wafers by grazing incidence X-ray fluorescence
dc.typeJournal article
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewyes
dc.source.beginpage1359
dc.source.endpage1364
dc.source.journalSpectrochimica Acta B
dc.source.issue12
dc.source.volume63
imec.availabilityPublished - imec
imec.internalnotessee also Note: Vol. 64(2009)pp.291


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