dc.contributor.author | Laidler, David | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | D'have, Koen | |
dc.contributor.author | Cheng, Shaunee | |
dc.date.accessioned | 2021-10-17T08:07:02Z | |
dc.date.available | 2021-10-17T08:07:02Z | |
dc.date.issued | 2008 | |
dc.identifier.issn | 1355-8633 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/13977 | |
dc.source | IIOimport | |
dc.title | Sources of overlay error in double patterning integration schemes | |
dc.type | Journal article | |
dc.contributor.imecauthor | Laidler, David | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | D'have, Koen | |
dc.contributor.orcidimec | Laidler, David::0000-0003-4055-3366 | |
dc.contributor.orcidimec | D'have, Koen::0000-0002-5195-9241 | |
dc.source.peerreview | no | |
dc.source.journal | Semiconductor Fabtech | |
dc.source.issue | 37 | |
imec.availability | Published - imec | |