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Sources of overlay error in double patterning integration schemes

dc.contributor.authorLaidler, David
dc.contributor.authorLeray, Philippe
dc.contributor.authorD'have, Koen
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-17T08:07:02Z
dc.date.available2021-10-17T08:07:02Z
dc.date.issued2008
dc.identifier.issn1355-8633
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/13977
dc.sourceIIOimport
dc.titleSources of overlay error in double patterning integration schemes
dc.typeJournal article
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorLeray, Philippe
dc.contributor.imecauthorD'have, Koen
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.source.peerreviewno
dc.source.journalSemiconductor Fabtech
dc.source.issue37
imec.availabilityPublished - imec


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