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Toward extending the capabilties of scanning spreading resistance microscopy for fin field-effect-transistor-based structures

dc.contributor.authorMody, Jay
dc.contributor.authorEyben, Pierre
dc.contributor.authorAugendre, Emmanuel
dc.contributor.authorRichard, Olivier
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-17T09:06:17Z
dc.date.available2021-10-17T09:06:17Z
dc.date.issued2008
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14178
dc.sourceIIOimport
dc.titleToward extending the capabilties of scanning spreading resistance microscopy for fin field-effect-transistor-based structures
dc.typeJournal article
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage351
dc.source.endpage356
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue1
dc.source.volume26
imec.availabilityPublished - open access


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