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Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

dc.contributor.authorMyers, Alan
dc.contributor.authorLorusso, Gian
dc.contributor.authorKim, In Sung
dc.contributor.authorGoethals, Mieke
dc.contributor.authorJonckheere, Rik
dc.contributor.authorHermans, Jan
dc.contributor.authorBaudemprez, Bart
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-10-17T09:14:08Z
dc.date.available2021-10-17T09:14:08Z
dc.date.issued2008
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14204
dc.sourceIIOimport
dc.titleExperimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections
dc.typeJournal article
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2215
dc.source.endpage2219
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume26
imec.availabilityPublished - open access
imec.internalnotesEIPBN 2008


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