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Observation of negative mask error enhancement factor due to mask transmission resonance

dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMesuda, Kei
dc.date.accessioned2021-10-17T09:51:05Z
dc.date.available2021-10-17T09:51:05Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14315
dc.sourceIIOimport
dc.titleObservation of negative mask error enhancement factor due to mask transmission resonance
dc.typeJournal article
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage20501
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.issue2
dc.source.volume7
imec.availabilityPublished - open access


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