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Influence of immersion lithography on wafer edge defectivity

dc.contributor.authorPollentier, Ivan
dc.contributor.authorSomanchi, A.
dc.contributor.authorBurkeen, F.
dc.contributor.authorVedula, S.
dc.date.accessioned2021-10-17T09:53:21Z
dc.date.available2021-10-17T09:53:21Z
dc.date.issued2008-02
dc.identifier.issn0038-111X
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14322
dc.sourceIIOimport
dc.titleInfluence of immersion lithography on wafer edge defectivity
dc.typeJournal article
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage38
dc.source.endpage41
dc.source.journalSolid State Technology
dc.source.issue2
dc.source.volume51
dc.identifier.urlhttp://sst.pennnet.com/display_article/319146/5/ARTCL/none/none/1/Influence-of-immersion-lithography-on-wafer-edge-defectivity/
imec.availabilityPublished - open access


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