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Comparison of standard macroscopic and Conductive AFM leakage measurements on gate removed high-k capacitors

dc.contributor.authorPolspoel, Wouter
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorAguilera, Lidia
dc.contributor.authorPorti, Marc
dc.contributor.authorNafria, Montserrat
dc.contributor.authorAymerich, Xavier
dc.date.accessioned2021-10-17T09:55:39Z
dc.date.available2021-10-17T09:55:39Z
dc.date.issued2008
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14329
dc.sourceIIOimport
dc.titleComparison of standard macroscopic and Conductive AFM leakage measurements on gate removed high-k capacitors
dc.typeOral presentation
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conference15th Workshop on Dielectrics in Microelectronics - WODIM
dc.source.conferencedate23/06/2008
dc.source.conferencelocationBad Saarow Germany
imec.availabilityPublished - imec


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