Internal photoemission of electrons from Ta-based conductors into SiO2 and HfO2 insulators
dc.contributor.author | Shamuilia, S. | |
dc.contributor.author | Afanasiev, Valeri | |
dc.contributor.author | Stesmans, Andre | |
dc.contributor.author | Schram, Tom | |
dc.contributor.author | Pantisano, Luigi | |
dc.date.accessioned | 2021-10-17T10:41:54Z | |
dc.date.available | 2021-10-17T10:41:54Z | |
dc.date.issued | 2008 | |
dc.identifier.issn | 0021-8979 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/14462 | |
dc.source | IIOimport | |
dc.title | Internal photoemission of electrons from Ta-based conductors into SiO2 and HfO2 insulators | |
dc.type | Journal article | |
dc.contributor.imecauthor | Afanasiev, Valeri | |
dc.contributor.imecauthor | Stesmans, Andre | |
dc.contributor.imecauthor | Schram, Tom | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 73722 | |
dc.source.journal | Journal of Applied Physics | |
dc.source.issue | 7 | |
dc.source.volume | 104 | |
imec.availability | Published - open access |