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Characterization of threading dislocations in thin germanium layers by defect etching: towards chromium and HF free solution

dc.contributor.authorSouriau, Laurent
dc.contributor.authorAtanasova, Tanya
dc.contributor.authorTerzieva, Valentina
dc.contributor.authorMoussa, Alain
dc.contributor.authorCaymax, Matty
dc.contributor.authorLoo, Roger
dc.contributor.authorMeuris, Marc
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-17T10:56:36Z
dc.date.available2021-10-17T10:56:36Z
dc.date.issued2008
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14502
dc.sourceIIOimport
dc.titleCharacterization of threading dislocations in thin germanium layers by defect etching: towards chromium and HF free solution
dc.typeJournal article
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorTerzieva, Valentina
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageH673
dc.source.endpageH681
dc.source.journalJournal of the Electrochemical Society
dc.source.issue9
dc.source.volume155
imec.availabilityPublished - open access


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