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Tensile strained Ge layers on strain-relaxed Ge1-xSnx/virtual Ge substrates

dc.contributor.authorTakeuchi, Shotaro
dc.contributor.authorSakai, Akira
dc.contributor.authorNakatsuka, Osamu
dc.contributor.authorOgawa, Masaki
dc.contributor.authorZaima, Shigeaki
dc.date.accessioned2021-10-17T11:08:31Z
dc.date.available2021-10-17T11:08:31Z
dc.date.issued2008
dc.identifier.issn0040-6090
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14535
dc.sourceIIOimport
dc.titleTensile strained Ge layers on strain-relaxed Ge1-xSnx/virtual Ge substrates
dc.typeJournal article
dc.source.peerreviewyes
dc.source.beginpage159
dc.source.endpage162
dc.source.journalThin Solid Films
dc.source.issue1
dc.source.volume517
imec.availabilityPublished - imec


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