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Oxygen chemiluminescence in He plasma as a method for plasma damage evaluation of Low-k dielectrics

dc.contributor.authorUrbanowicz, Adam
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-17T11:28:47Z
dc.date.available2021-10-17T11:28:47Z
dc.date.issued2008
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/14589
dc.sourceIIOimport
dc.titleOxygen chemiluminescence in He plasma as a method for plasma damage evaluation of Low-k dielectrics
dc.typeJournal article
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage2164
dc.source.endpage2168
dc.source.journalMicroelectronic Engineering
dc.source.issue10
dc.source.volume85
imec.availabilityPublished - open access


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