Show simple item record

Si+ ion implantation for strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructures

dc.contributor.authorBuca, Daniel
dc.contributor.authorMinamisawa, R.A.
dc.contributor.authorTrinkaus, H
dc.contributor.authorMantl, S
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-17T21:29:55Z
dc.date.available2021-10-17T21:29:55Z
dc.date.issued2009
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15057
dc.sourceIIOimport
dc.titleSi+ ion implantation for strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructures
dc.typeJournal article
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage114905
dc.source.journalJournal of Applied Physics
dc.source.issue11
dc.source.volume105
imec.availabilityPublished - open access


Files in this item

Thumbnail
Name:
18827.pdf
Size:
1.219Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record