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Impact of mask three dimensional effects on resist-model calibration

dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorMuelders, Thomas
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorSchmoeller, Thomas
dc.contributor.authorBiafore, John
dc.contributor.authorRobertson, Stewart A.
dc.contributor.authorSmith, Mark
dc.date.accessioned2021-10-17T21:44:57Z
dc.date.available2021-10-17T21:44:57Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15160
dc.sourceIIOimport
dc.titleImpact of mask three dimensional effects on resist-model calibration
dc.typeJournal article
dc.contributor.imecauthorDe Bisschop, Peter
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage30501
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS (JM3 Letters)
dc.source.issue3
dc.source.volume8
imec.availabilityPublished - open access


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