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Liftoff-Technik für dünnste Silizium-Wafer

dc.contributor.authorDross, Frederic
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-17T22:00:56Z
dc.date.available2021-10-17T22:00:56Z
dc.date.issued2009
dc.identifier.issn0930-1100
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15248
dc.sourceIIOimport
dc.titleLiftoff-Technik für dünnste Silizium-Wafer
dc.typeJournal article
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage8
dc.source.endpage9
dc.source.journalProductronic
dc.source.issue1_2
imec.availabilityPublished - imec


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