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dc.contributor.authorFerain, Isabella
dc.contributor.authorDuffy, Ray
dc.contributor.authorCollaert, Nadine
dc.contributor.authorVan Dal, Mark
dc.contributor.authorPawlak, Bartek
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorRooyackers, Rita
dc.contributor.authorConard, Thierry
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKaiser, M.
dc.contributor.authorWeemaes, R.
dc.contributor.authorSwerts, Johan
dc.contributor.authorJurczak, Gosia
dc.contributor.authorLander, Rob
dc.contributor.authorDe Meyer, Kristin
dc.date.accessioned2021-10-17T22:11:49Z
dc.date.available2021-10-17T22:11:49Z
dc.date.issued2009
dc.identifier.issn0038-1101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15300
dc.sourceIIOimport
dc.titlePerformance improvement in narrow MuGFETs by gate work function and source/drain implant engineering
dc.typeJournal article
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorVan Dal, Mark
dc.contributor.imecauthorPawlak, Bartek
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorDe Meyer, Kristin
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage760
dc.source.endpage766
dc.source.journalSolid-State Electronics
dc.source.issue7
dc.source.volume53
imec.availabilityPublished - imec


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