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Extreme ultraviolet interference lithography as applied to photoresist studies

dc.contributor.authorGronheid, Roel
dc.contributor.authorLeeson, Michael
dc.date.accessioned2021-10-17T22:35:06Z
dc.date.available2021-10-17T22:35:06Z
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15402
dc.sourceIIOimport
dc.titleExtreme ultraviolet interference lithography as applied to photoresist studies
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage21205
dc.source.journalJournal of Micro/Nanolithography, MEMS, and MOEMS
dc.source.issue2
dc.source.volume8
imec.availabilityPublished - open access


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