dc.contributor.author | Klostermann, U. | |
dc.contributor.author | Mülders, T. | |
dc.contributor.author | Ponomarenco, D. | |
dc.contributor.author | Schmöller, T. | |
dc.contributor.author | Van de Kerkhove, Jeroen | |
dc.contributor.author | De Bisschop, Peter | |
dc.date.accessioned | 2021-10-17T23:31:13Z | |
dc.date.available | 2021-10-17T23:31:13Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15608 | |
dc.source | IIOimport | |
dc.title | Calibration of physical resist models: methods, usability, and predictive power | |
dc.type | Journal article | |
dc.contributor.imecauthor | Van de Kerkhove, Jeroen | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 33005 | |
dc.source.journal | Journal of Micro/Nanolithography, MEMS, and MOEMS | |
dc.source.issue | 3 | |
dc.source.volume | 8 | |
imec.availability | Published - open access | |