dc.contributor.author | Klostermann, Ulrich | |
dc.contributor.author | Mülders, Thomas | |
dc.contributor.author | Ponomarenco, Denis | |
dc.contributor.author | Schmoeller, Thomas | |
dc.contributor.author | Van de Kerkhove, Jeroen | |
dc.contributor.author | De Bisschop, Peter | |
dc.date.accessioned | 2021-10-17T23:31:29Z | |
dc.date.available | 2021-10-17T23:31:29Z | |
dc.date.issued | 2009 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/15609 | |
dc.source | IIOimport | |
dc.title | Calibration of physical resist models: methods, usability, and predictive power | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Van de Kerkhove, Jeroen | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 727318 | |
dc.source.conference | Advances in Resist Materials and Processing Technology XXVI | |
dc.source.conferencedate | 22/02/2009 | |
dc.source.conferencelocation | San Jose. CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE; Vol. 7273 | |