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Thin-film boron-doped polycrystalline silicon70%-germanium30% for thermopiles

dc.contributor.authorVan Gerwen, Peter
dc.contributor.authorSlater, Tim
dc.contributor.authorChévrier, Jean-Baptiste
dc.contributor.authorBaert, Kris
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-09-29T15:39:21Z
dc.date.available2021-09-29T15:39:21Z
dc.date.issued1996
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1578
dc.sourceIIOimport
dc.titleThin-film boron-doped polycrystalline silicon70%-germanium30% for thermopiles
dc.typeJournal article
dc.contributor.imecauthorMertens, Robert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage325
dc.source.endpage329
dc.source.journalSensors and Actuators A
dc.source.volumeA53
imec.availabilityPublished - open access


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